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3D Nanopatterning and Nanofabrication: Using Nano-Scalloping Effects in Bosch Deep Reactive Ion Etching
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Micromachines | Free Full-Text | Reduced Etch Lag and High Aspect Ratios by Deep Reactive Ion Etching (DRIE)
Fabrication of three-layer silicon antireflection structures in 200–450 GHz using deep reactive ion etching
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Fabrication process in which deep reactive ion etching (DRIE) is used... | Download Scientific Diagram
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Figure 1 from Ultra Deep Reactive Ion Etching of High Aspect-Ratio and Thick Silicon Using a Ramped-Parameter Process | Semantic Scholar
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